Formation of the crystalline β-C3N4 phase by dual ion beam sputtering deposition
- 31 January 1995
- journal article
- Published by Elsevier in Materials Letters
- Vol. 22 (1-2), 115-118
- https://doi.org/10.1016/0167-577x(94)00233-9
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Physical properties of a-C: N films produced by ion beam assisted depositionJournal of Materials Research, 1994
- Experimental Realization of the Covalent Solid Carbon NitrideScience, 1993
- Growth and characterization of C-N thin filmsSurface and Coatings Technology, 1992
- Physical properties of plasma-enhanced chemically vapour deposited hydrogenated and nitrogenated amorphous carbonsSurface and Coatings Technology, 1991
- Structure and bonding studies of the C:N thin films produced by rf sputtering methodJournal of Materials Research, 1990
- Structural properties and electronic structure of low-compressibility materials: β- and hypothetical β-Physical Review B, 1990
- Prediction of New Low Compressibility SolidsScience, 1989
- Symmetry breaking in nitrogen-doped amorphous carbon: Infrared observation of the Raman-activeGandDbandsPhysical Review B, 1989
- Calculation of bulk moduli of diamond and zinc-blende solidsPhysical Review B, 1985
- Crystal Structures of Silicon NitrideNature, 1957