A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor
- 1 January 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 359 (2), 188-196
- https://doi.org/10.1016/s0040-6090(99)00883-4
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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