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Range and Standard Deviation of Ion-Implanted Phosphorus in Silicon
Home
Publications
Range and Standard Deviation of Ion-Implanted Phosphorus in Silicon
Range and Standard Deviation of Ion-Implanted Phosphorus in Silicon
HO
Hidekazu Okabayashi
Hidekazu Okabayashi
DS
Daizaburo Shinoda
Daizaburo Shinoda
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1 July 1974
journal article
Published by
IOP Publishing
in
Japanese Journal of Applied Physics
Vol. 13
(7)
,
1187-1188
https://doi.org/10.1143/jjap.13.1187
Abstract
No abstract available
Keywords
STANDARD DEVIATION
PHOSPHORUS IN SILICON
DEVIATION OF ION
ION IMPLANTED PHOSPHORUS
Cited by 2 articles