Preparation of silicon nitride single crystals by chemical vapor deposition
- 1 October 1974
- journal article
- Published by Elsevier BV in Journal of Crystal Growth
- Vol. 24-25, 183-187
- https://doi.org/10.1016/0022-0248(74)90301-7
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Silicon Nitride Thin Films from SiCl[sub 4] Plus NH[sub 3]: Preparation and PropertiesJournal of the Electrochemical Society, 1968
- Some Properties of Vapor Deposited Silicon Nitride Films Using the SiH[sub 4]-NH[sub 3]-H[sub 2] SystemJournal of the Electrochemical Society, 1967
- Properties of Amorphous Silicon Nitride FilmsJournal of the Electrochemical Society, 1966