Film structure and magnetic properties for Co-Cr sputtered films
- 1 September 1984
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 20 (5), 2019-2024
- https://doi.org/10.1109/tmag.1984.1063468
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961