Uniaxial stress apparatus for an EPR X-band spectrometer
- 1 February 1976
- journal article
- letter
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 47 (2), 252-253
- https://doi.org/10.1063/1.1134599
Abstract
A simple system for examining the influence of uniaxial stress on the X‐band EPR spectrum has been designed and fabricated. The system is capable of applying a compressive uniaxial stress up to 3500 kg/cm2, permits investigation of the angular dependence of the EPR spectra, and can operate in the temperature range of 80–400 K.Keywords
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- Electron Spin Resonance Experiments on Donors in Silicon. III. Investigation of Excited States by the Application of Uniaxial Stress and Their Importance in Relaxation ProcessesPhysical Review B, 1961