Synthesis of III–V semiconductor nitrides by reactive cathodic sputtering
- 15 July 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 36 (1), 141-145
- https://doi.org/10.1016/0040-6090(76)90423-5
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Space-charge-limited current flow in gallium nitride thin filmsPhysical Review B, 1974
- rf-sputtered aluminum nitride films on sapphireApplied Physics Letters, 1974
- Electrical and Optical Properties of rf-Sputtered GaN and InNApplied Physics Letters, 1972