Reactive Ion Etching of RuO2 Films: The Role of Additive Gases in O2 Discharge
- 1 May 1997
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 161 (1), 201-215
- https://doi.org/10.1002/1521-396x(199705)161:1<201::aid-pssa201>3.0.co;2-u
Abstract
No abstract availableKeywords
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