The adsorption of cationic surfactants on photoresist surfaces and its effect on the pattern collapse in high aspect ratio patterning
- 1 December 2007
- journal article
- Published by Elsevier BV in Colloids and Surfaces A: Physicochemical and Engineering Aspects
- Vol. 311 (1-3), 83-92
- https://doi.org/10.1016/j.colsurfa.2007.05.069
Abstract
No abstract availableKeywords
Funding Information
- Bundesministerium für Bildung und Forschung (01M3154D)
- Infineon Technologies (SC300)
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