Fabrication of arrays of superconducting microbridges

Abstract
Two methods have been developed to fabricate superconducting microbridges, i. e. scratching with a diamond point and electron-optical imaging on an electron-sensitive film. With the scratching technique, utilizing a special plate spring arrangement to determine the bridge width, arrays of microbridges have been fabricated. Distances between bridges can be varied at will from 4 μm upwards. Bridge dimensions are approximately 0.5 μm. With electron-optical imaging smaller bridges can be fabricated ; the method can easily be extended to the fabrication of arrays

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