Deposition of ZnO films by rf sputtering
- 30 September 1983
- journal article
- Published by Elsevier in Materials Chemistry and Physics
- Vol. 9 (1-3), 197-203
- https://doi.org/10.1016/0254-0584(82)90019-0
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Transparent and highly conductive films of ZnO prepared by rf reactive magnetron sputteringApplied Physics Letters, 1981
- The effect of rf power on reactively sputtered zinc oxideJournal of Applied Physics, 1980
- The effect of O2 on reactively sputtered zinc oxideJournal of Applied Physics, 1980
- Postdeposition annealing behavior of rf sputtered ZnO filmsJournal of Vacuum Science and Technology, 1980
- Structures and SAW properties of rf-sputtered single-crystal films of ZnO on sapphireJournal of Applied Physics, 1980
- Microstructure of ZnO films used for acoustic surface-wave generationJournal of Vacuum Science and Technology, 1975
- High Resistivity Transparent ZnO Thin FilmsJournal of Vacuum Science and Technology, 1970
- PREPARATION OF ZnO THIN FILMS BY SPUTTERING OF THE COMPOUND IN OXYGEN AND ARGONApplied Physics Letters, 1966
- Der Einfluß von gelöstem Sauerstoff auf die elektrische Leitfähigkeit von ZinkoxydThe European Physical Journal A, 1952
- Quantitatives zur lichtelektrischen Leitung in ZinkoxydAnnalen der Physik, 1948