Excimer laser ablation of fused silica
- 1 January 1992
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 54, 193-200
- https://doi.org/10.1016/0169-4332(92)90043-w
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- Effect of intense and prolonged 248 nm pulsed-laser irradiation on the properties of ultraviolet-grade fused silicaApplied Physics Letters, 1991
- Glass surface treatment with excimer and CO2 lasersApplied Surface Science, 1990
- Photochemically assisted laser ablation of doped polymethyl-methacrylateApplied Surface Science, 1990
- Picosecond laser sputtering of sapphire at 266 nmApplied Physics Letters, 1989
- Intensity-induced nonlinear effects in UV window materialsApplied Physics B Laser and Optics, 1989
- Intensity-dependent loss properties of window materials at 248 nmOptics Letters, 1989
- Simple method for temporal study of subpicosecond distributed feedback dye lasersOptics Communications, 1989
- Simplified laser system for the generation of 60 fs pulses at 248 nmOptics Communications, 1988
- Ultraviolet laser ablation and etching of polymethyl methacrylate sensitized with an organic dopantApplied Physics A, 1988
- Importance of Fresnel reflections in laser surface damage of transparent dielectricsApplied Physics Letters, 1972