Doping Influences on Activator Diffusion in Oxide-Coated Cathode Nickel
- 1 October 1959
- journal article
- Published by Physical Society of Japan in Journal of the Physics Society Japan
- Vol. 14 (10), 1295-1301
- https://doi.org/10.1143/jpsj.14.1295
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Influence of Doping on Diffusion Rate of Impurities in Cathode NickelJournal of Applied Physics, 1958
- Lattice and Grain Boundary Self-Diffusion in SilverJournal of Applied Physics, 1951
- Calculation of Diffusion Penetration Curves for Surface and Grain Boundary DiffusionJournal of Applied Physics, 1951
- I.The influence of impurities in the core-metal on the thermionic emission from oxide-coated nickelJournal of Computers in Education, 1935