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Polycrystalline Silicon Oxidation Kinetics and Si / SiO2 Interface Width
Home
Publications
Polycrystalline Silicon Oxidation Kinetics and Si / SiO2 Interface Width
Polycrystalline Silicon Oxidation Kinetics and Si / SiO2 Interface Width
GQ
G. Queirolo
G. Queirolo
GG
G. Ghidini
G. Ghidini
LM
L. Meda
L. Meda
CS
C. Signorini
C. Signorini
AA
A. Armigliato
A. Armigliato
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1 November 1986
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 133
(11)
,
2381-2385
https://doi.org/10.1149/1.2108412
Abstract
No abstract available
Cited by 6 articles