Heteroepitaxial Growth of Nanostructured Cerium Dioxide Thin Films by MOCVD on a (001) TiO2 Substrate
- 14 March 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 15 (7), 1434-1440
- https://doi.org/10.1021/cm021348r
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Metal−Organic Chemical Vapor Deposition of CeO2 〈100〉 Oriented Films on No-Rolled Hastelloy C276Chemistry of Materials, 2001
- Microwave Dielectric Loss of Titanium OxideJournal of the American Ceramic Society, 2000
- Fabrication of in-plane aligned YBCO films on polycrystalline Ni tapes buffered with surface-oxidized NiO layersIEEE Transactions on Applied Superconductivity, 1999
- Growth of high-Tcthin filmsSuperconductor Science and Technology, 1999
- Recent advances in electrochromics for smart windows applicationsSolar Energy, 1998
- Preparation of buffer layers for HTS materials by MOCVDJournal of Alloys and Compounds, 1997
- The use of Ce(fod)4 as a precursor for the growth of ceria films by metal-organic chemical vapour depositionThin Solid Films, 1996
- Application of Superconducting Films to Fault Current LimiterJapanese Journal of Applied Physics, 1994
- Suppression of Diamagnetic Susceptibility in Extremely Thin Cylindrical SuperconductorJapanese Journal of Applied Physics, 1991
- In Situ RHEED Observation of CeO2 Film Growth on Si by Laser Ablation Deposition in Ultrahigh-VacuumJapanese Journal of Applied Physics, 1990