Economic and technical case for ion projection lithography
- 1 July 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (4), 2444-2448
- https://doi.org/10.1116/1.590188
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- In situ distortion measurement of an ion projector with 5× ion-optical reductionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Sub-20-nm-wide line fabrication in poly(methylmethacrylate) using a Ga+ microprobeJournal of Vacuum Science & Technology B, 1989
- Ion projection lithography machine IPLM-01: A new tool for sub-0.5-micron modification of materialsJournal of Vacuum Science & Technology B, 1986
- Polymethyl methacrylate sensitivity variation versus the electronic stopping power at ion lithography exposureApplied Physics Letters, 1981