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Enhanced Diffusion in Boron Implanted Silicon
Home
Publications
Enhanced Diffusion in Boron Implanted Silicon
Enhanced Diffusion in Boron Implanted Silicon
LH
L. C. Hopkins
L. C. Hopkins
TS
T. E. Seidel
T. E. Seidel
JW
J. S. Williams
J. S. Williams
JB
J. C. Bean
J. C. Bean
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1 August 1985
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 132
(8)
,
2035-2036
https://doi.org/10.1149/1.2114279
Abstract
No abstract available
Keywords
SEMIMETALS
ELEMENTS
CRYSTALLOGRAPHY
MATERIALS SCIENCE
CRYSTAL STRUCTURE
DIFFUSION MODEL
ANNEALING
CRYSTAL DEFECTS
BORON
DIFFUSION
HEAT TREATMENT
DISTRIBUTION
MATHEMATICAL MODEL
MATERIALS
SIMULATION
TEMPERATURE GRADIENT
SILICON
ION IMPLANTATION
MATHEMATICAL MODELS
SCATTERING
Cited by 12 articles