Short-pulse excitation of a xenon molecular dissociation laser at 172.9 nm by relativistic electrons
- 15 December 1973
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 23 (12), 672-674
- https://doi.org/10.1063/1.1654786
Abstract
Laser action at 172.9 nm has been observed in xenon and krypton‐xenon mixtures following short‐pulse excitation (2.5 nsec) by a relativistic electron beam. Peak powers [inverted lazy s] 80 kW cm−2 in a 5‐nsec pulse were obtained. The pumping sheme used in this work is noteworthy because its high efficiency has made it possible to utilize a simple compact electron accelerator (total electron beam energy 6 J) for excitation. The present short‐pulse data suggest that the rapid decrease in energy efficiency of this laser at high xenon pressures may be due to excited‐state quenching by ground‐state xenon atoms.Keywords
This publication has 4 references indexed in Scilit:
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- Quenching of vacuum ultraviolet fluorescence emission from electron beam excited quasi-molecular xenonOptics Communications, 1973
- Electronic Energy Transfer Phenomena in Rare GasesThe Journal of Chemical Physics, 1972
- Stimulated VUV emission in high-pressure xenon excited by high-current relativistic electron beamsApplied Physics Letters, 1972