X-ray photoelectron spectroscopy study of hydrogen plasma interactions with a tin oxide surface
- 1 May 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 42 (9), 794-796
- https://doi.org/10.1063/1.94097
Abstract
Tin oxide thin films were exposed to an rf excited hydrogen plasma (100 mTorr) for various times. The plasma system was operated in a self‐biased mode. X‐ray photoelectron spectroscopy analysis of vacuum transferred samples shows that SnO2 is reduced. A thin self‐limiting layer of elemental Sn forms on the reduced film to a thickness of ∼10 Å.Keywords
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