Nanostructured integrated electron source
- 1 March 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (2), 862-865
- https://doi.org/10.1116/1.589921
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Characterization of ultrasharp field emitters by projection microscopyApplied Surface Science, 1996
- Electrical and field emission properties of nanocrystalline materials fabricated by electron-beam induced depositionMicroelectronic Engineering, 1996
- Comparative study of supertips for electron field emittersPublished by SPIE-Intl Soc Optical Eng ,1995
- Field-ion imaging of a tungsten supertipApplied Physics A, 1995
- Characterization and Application of Materials Grown by Electron-Beam-Induced DepositionJapanese Journal of Applied Physics, 1994
- Three-dimensional structurization by additive lithography, analysis of deposits using TEM and EDX, and application to field-emitter tipsMicroelectronic Engineering, 1994
- High-resolution electron-beam induced depositionJournal of Vacuum Science & Technology B, 1988
- Physical properties of thin-film field emission cathodes with molybdenum conesJournal of Applied Physics, 1976
- Das Auflösungsvermögen des FeldelektronenmikroskopsThe European Physical Journal A, 1943