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Interconnect fabrication processes and the development of low-cost wiring for CMOS products
Home
Publications
Interconnect fabrication processes and the development of low-cost wiring for CMOS products
Interconnect fabrication processes and the development of low-cost wiring for CMOS products
TL
T. J. Licata
T. J. Licata
EC
E. G. Colgan
E. G. Colgan
JH
J. M. E. Harper
J. M. E. Harper
SL
S. E. Luce
S. E. Luce
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1 July 1995
journal article
Published by
IBM
in
IBM Journal of Research and Development
Vol. 39
(4)
,
419-435
https://doi.org/10.1147/rd.394.0419
Abstract
No abstract available
Cited by 46 articles