The effects of nucleation and growth on epitaxy in the CoSi2/Si system
- 1 July 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 93 (1-2), 99-108
- https://doi.org/10.1016/0040-6090(82)90095-5
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Epitaxial silicidesThin Solid Films, 1982
- Growth of single-crystal CoSi2 on Si(111)Applied Physics Letters, 1982
- Cross-sectional transmission electron microscopy of silicon-silicide interfacesJournal of Applied Physics, 1981
- Silicon/metal silicide heterostructures grown by molecular beam epitaxyApplied Physics Letters, 1980
- The scattering of electrons by atoms and crystals. I. A new theoretical approachActa Crystallographica, 1957