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Surface profile analysis by helium-3 activation; oxygen in silicon
Home
Publications
Surface profile analysis by helium-3 activation; oxygen in silicon
Surface profile analysis by helium-3 activation; oxygen in silicon
JL
James F. Lamb
James F. Lamb
DL
Diana M. Lee
Diana M. Lee
SM
Samuel S. Markowitz
Samuel S. Markowitz
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1 February 1970
journal article
Published by
American Chemical Society (ACS)
in
Analytical Chemistry
Vol. 42
(2)
,
212-215
https://doi.org/10.1021/ac60284a026
Abstract
No abstract available
Cited by 13 articles