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Effects of O 2 Feed Gas Impurity on Cl2 Based Plasma Etching of Polysilicon
Home
Publications
Effects of O 2 Feed Gas Impurity on Cl2 Based Plasma Etching of Polysilicon
Effects of O 2 Feed Gas Impurity on Cl2 Based Plasma Etching of Polysilicon
GZ
Gavin C. H. Zau
Gavin C. H. Zau
HS
Herbert H. Sawin
Herbert H. Sawin
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1 January 1992
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 139
(1)
,
250-256
https://doi.org/10.1149/1.2069179
Abstract
No abstract available
Keywords
PLASMA ETCHING
Cited by 52 articles