Effect of temperature on the dissociative and nondissociative electron attachment to C3F8

Abstract

The rate constant for total electron attachment to C₃F₈ has been measured as a function of the mean electron energy in the range 0.76–4.81 eV and the temperature T in the range 300–750 K using a swarm apparatus; it was found to first decrease and then increase with increasing T. The former behavior is due to nondissociative and the latter due to dissociative electron attachment processes whose rate constants, respectively, decrease and increase with increasing T. The measured dependence of the total attachment rate constant on the gas pressure and temperature was used to quantify the contribution of dissociative and nondissociative electron attachment in C₃F₈ as a function of electron energy.