Sub10nm silicon field emitters produced by electron beam lithography and isotropic plasma etching
- 28 February 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 27 (1-4), 95-98
- https://doi.org/10.1016/0167-9317(94)00064-2
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Sharp silicon tips for AFM and field emissionMicroelectronic Engineering, 1994
- 100 kV thermal field emission electron beam lithography tool for high-resolution x-ray mask patterningJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- The Oxidation of Shaped Silicon SurfacesJournal of the Electrochemical Society, 1982