Characterization of thin films containing zirconium, oxygen, and sulfur by scanning electron and atomic force microscopy
- 1 September 1999
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 14 (9), 3725-3733
- https://doi.org/10.1557/jmr.1999.0503
Abstract
Oxidic zirconium films prepared by chemical deposition from aqueous medium on sulfonic acid terminated self-assembled monolayers attached to an oxidized silicon surface were investigated with scanning electron microscopy and atomic force microscopy. Bulk precipitate forms in the 4 mM Zr(SO4)2 · 4H2O, 0.4 N HCl deposition medium at 343 K after approximately 30 min. Precipitate particles (200 nm and larger) were found embedded in the oxidic zirconium film and adsorbed on top of the film; they could be washed off, but patches of the film were removed. Working with unstable deposition solutions, in which homogeneous nucleation occurs, leads to preparation-inherent flaws in the film.Keywords
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