In situ monitoring during pulsed laser deposition of complex oxides using reflection high energy electron diffraction under high oxygen pressure
- 7 April 1997
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 70 (14), 1888-1890
- https://doi.org/10.1063/1.118687
Abstract
A suitable in situ monitoring technique for growth of thin films is reflection high energy electron diffraction (RHEED). Deposition techniques, like pulsed laser deposition (PLD) and sputter deposition, used for fabrication of complex oxide thin films use relatively high oxygen pressures (up to 100 Pa) and are, therefore, not compatible with ultrahigh vacuum RHEED equipment. We have developed a RHEED system which can be used for growth monitoring during the deposition of complex oxides at standard PLD conditions. We are able to increase the deposition pressure up to 50 Pa using a two-stage differential pumping system. Clear RHEED patterns are observable at these high pressures. The applicability of this system is demonstrated with the study of homoepitaxial growth of SrTiO3 as well as the heteroepitaxial growth of YBa2Cu3O7-δ on SrTiO3. Intensity oscillations of the RHEED reflections, indicating two-dimensional growth, are observed up to several tens of nanometers film thickness in both caseKeywords
This publication has 10 references indexed in Scilit:
- Growth-related stress and surface morphology in homoepitaxial SrTiO3 filmsApplied Physics Letters, 1996
- Analysis of Growing Films of Complex Oxides by RHEEDMRS Bulletin, 1995
- Atomic Control of the SrTiO 3 Crystal SurfaceScience, 1994
- Atomic scale oxide superlattices grown by RHEED controlled pulsed laser depositionJournal of Materials Research, 1994
- Atomic layer control in Sr-Cu-O artificial lattice growthApplied Physics Letters, 1994
- Origin of RHEED intensity oscillations during the growth of (Y,Dy) thin filmsPhysical Review B, 1994
- Atomic force microscopy on homoepitaxial SrTiO3 films grown under monitoring of intensity oscillation in reflection high energy electron diffractionApplied Physics Letters, 1992
- Reflection high-energy electron diffraction oscillations modulated by laser-pulse depositedPhysical Review Letters, 1992
- Atomic layer and unit cell layer growth of (Ca,Sr)CuO2 thin film by laser molecular beam epitaxyApplied Physics Letters, 1991
- Reflection high-energy electron diffraction oscillations during epitaxial growth of high-temperature superconducting oxidesPhysical Review Letters, 1990