Fabrication of a-Si: H films by microwave plasmas under electron cyclotron resonance conditions
- 1 December 1985
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 77-78, 765-768
- https://doi.org/10.1016/0022-3093(85)90772-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The effects of deposition parameters on a-Si:H films fabricated by microwave glow discharge techniquesJournal of Non-Crystalline Solids, 1983
- Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasmaJournal of Non-Crystalline Solids, 1983
- Evidence for a time dependent excitation process in silane radio frequency glow dischargesJournal of Applied Physics, 1983