Behavior of edge-grown low-capacitance superconducting tunnel junctions
- 1 January 1980
- journal article
- letter
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 51 (1), 802-804
- https://doi.org/10.1063/1.327298
Abstract
By growing the oxide barrier on the edge of a thin film rather than on its flat surface, we have succeeded in obtaining small‐area tunnel junctions. The fabrication process suitable for integration of many elements in small circuits is described. Supercurrent response to magnetic and microwave fields unambiguously characterize the Josephson behavior of these junctions.Keywords
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