LIGA process: sensor construction techniques via X-ray lithography
- 6 January 2003
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
The LIGA (from the German Lithographie, Galvanoformung, Abformung) method, based on deep-etch X-ray lithography, electroforming and molding processes, is described. This microfabrication technique makes it possible to generate devices with minimal lateral dimensions in the micrometer range and structural heights of several hundred micrometers from metallic and plastic materials. In contrast to orientation-dependent etching of monocrystalline silicon, there are no restrictions on the cross-sectional shape of the microstructures. Various concepts of sensors for measuring vibration, acceleration, position, spectral distribution, radiation, composition of mixtures, etc. are presented.<>Keywords
This publication has 2 references indexed in Scilit:
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- Infrared high-pass filter with high contrastInternational Journal of Infrared and Millimeter Waves, 1981