Effects of elastic-electron scattering on measurements of silicon dioxide film thicknesses by X-ray photoelectron spectroscopy
- 31 March 2001
- journal article
- Published by Elsevier in Journal of Electron Spectroscopy and Related Phenomena
- Vol. 114-116, 1139-1143
- https://doi.org/10.1016/s0368-2048(00)00254-1
Abstract
No abstract availableKeywords
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