A study by elastically reflected electrons of InP(100) substrates previously ion bombarded
- 14 January 1986
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 19 (1), 137-145
- https://doi.org/10.1088/0022-3727/19/1/018
Abstract
The current Ie of elastically reflected electrons on (100) InP substrates was determined by measuring the spectral distribution and the current transmitted by the optical system. A method allowing one to calculate the current of electrons Ie, elastically reflected by a stacking of alternating A and B monolayers ended by a mixed monolayer, is developed. The method is applied to clean and stable InP(100) surfaces previously studied by Auger electron spectroscopy. The correlation between the results obtained by these two techniques performed on samples chemically cleaned both bombarded with Ar+ ions at low energy and room temperature, allows one to consider the stacking model (0.75 In+0.25 P)/P/In/P as the most reliable.Keywords
This publication has 4 references indexed in Scilit:
- Effect of ion bombardment at low energy on (100)InP surfaces, studied by Auger electron spectroscopySurface Science, 1985
- Elastic peak electron spectroscopy for auger electron spectroscopy and electron energy loss spectroscopySurface and Interface Analysis, 1981
- Quantitative electron spectroscopy of surfaces: A standard data base for electron inelastic mean free paths in solidsSurface and Interface Analysis, 1979
- Interaction of Slow Electrons with SurfacesJournal of Vacuum Science and Technology, 1970