X-ray photoelectron spectroscopy and infrared study of the processing of a silylated positive photoresist
- 1 November 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (6), 3406-3412
- https://doi.org/10.1116/1.585349