Optimization of MW-PACVD diamond deposition parameters for high nucleation density and growth rate on Si3N4 substrate
- 1 March 1997
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 6 (2-4), 411-416
- https://doi.org/10.1016/s0925-9635(96)00711-x
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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