Flux Reversal in Thin Films of 82% Ni, 18% Fe

Abstract

The magnetization reversal process of iron‐nickel films (nominally 82% Ni‐18% Fe) deposited in the presence of a magnetic field to a thickness of about 1000 A to 4000 A have been examined by the application of appropriate fields. Experimental results indicate that at least two different magnetization reversal mechanisms are effective. The first, characterized by relatively long remagnetization periods, involves domain‐wall movement; the second, characterized by relatively short remagnetization periods, is consistent with the rotation of the magnetization in the plane of the film. The threshold for the rotational process is altered by the application of transverse magnetic field in a manner consistent with a simple energy model.