Chlorine Concentration Profiles in O 2 / HCl and H 2 O / HCl Thermal Silicon Oxides Using SIMS Measurements
- 1 December 1978
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 125 (12), 2024-2027
- https://doi.org/10.1149/1.2131356