Characteristics of high quality ZnO thin films deposited by pulsed laser deposition
- 5 December 1994
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 65 (23), 2963-2965
- https://doi.org/10.1063/1.112478
Abstract
Thin films of ZnO have been deposited on glass and silicon substrates by the pulsed laser deposition technique employing a KrF laser (λ=248 nm). The influence of the deposition parameters, such as substrate temperature, oxygen pressure, and laser fluence on the properties of the grown films, has been studied. All the films grown over a rather wide range of deposition conditions were found to be optically transparent, electrically conductive, and c‐axis oriented, with the full width at half‐maximum (FWHM) of the (002) x‐ray reflection line being very often less than 0.25°. Under optimized laser fluence and oxygen pressure conditions, highly c‐axis oriented films having a FWHM value less than 0.15° and optical transmittance around 85% in the visible region of the spectrum have been grown at a substrate temperature of only 350 °C. These are among the best properties yet reported for ZnO films grown by any technique at such a low temperature.Keywords
This publication has 27 references indexed in Scilit:
- Growth of ZnO films on GaAs substrates with a SiO2 buffer layer by RF planar magnetron sputtering for surface acoustic wave applicationsJournal of Crystal Growth, 1994
- Extension of the spectral response of sprayed ZnO thin film electrodes induced by nickel and cobalt dopingSemiconductor Science and Technology, 1994
- Zinc oxide films prepared by dc reactive magnetron sputtering at different substrate temperaturesVacuum, 1994
- Force sensing microcantilever using sputtered zinc oxide thin filmApplied Physics Letters, 1994
- Aluminum-doped zinc oxide transparent conductors deposited by the sol-gel processThin Solid Films, 1994
- Post-deposition annealing of RF-sputtered zinc-oxide filmsApplied Surface Science, 1993
- Growth of textured ZnO:In thin films by chemical spray depositionThin Solid Films, 1993
- Atmospheric pressure chemical vapor deposition of gallium doped zinc oxide thin films from diethyl zinc, water, and triethyl galliumJournal of Applied Physics, 1992
- Thermally stable ZnO films deposited on GaAs substrates with a SiO2 thin buffer layerApplied Physics Letters, 1992
- High-rate (∼50-Å/s) deposition of ZnO films for amorphous silicon alloy solar-cell back-reflector applicationJournal of Applied Physics, 1991