Channeling effect of low energy boron implant in

Publisher Website

1 March 1983

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters

Vol. 4 (3), 59-62
https://doi.org/10.1109/edl.1983.25647

Abstract

Unintentional ion channeling in low energy ion implantation of boron into

Keywords

Cited by 93 articles