High-temperature strength stability of three forms of chemically vapor deposited tungsten

Abstract

Three types of CVD tungsten (fluoride-produced, chloride-produced, and a layered composite of the two-termed duplex) were evaluated to determine their high-temperature strength and microstructural stability following 5000-h exposure to temperatures of 1540 and 1700 °C. At the highest temperatures investigated (1540 and 1700 °C) the tensile strengths of the two basic materials were essentially equal. At lower temperatures, chloride tungsten possessed lower yield strength but higher ultimate strength than fluoride tungsten while the behavior of the duplex material was generally intermediate. Apparent anomalies in high-temperature elongation behavior are explained on the basis of grain boundary cavity formation and recrystallization. The grain size of fluoride tungsten changed only slightly following 5000-h treatment at 1700 °C. In contrast, chloride tungsten possessed both poor resistance to grain growth and an accompanying relatively high ductile–brittle transition temperature.