Diffusion across a Semiconductor-Vapour Interface
- 1 September 1958
- journal article
- Published by IOP Publishing in Proceedings of the Physical Society
- Vol. 72 (3), 369-379
- https://doi.org/10.1088/0370-1328/72/3/307
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Diffusion of Antimony Out of Germanium and Some Properties of the Antimony-Germanium SystemPhysical Review B, 1957
- Evaporation of Impurities from SemiconductorsJournal of Applied Physics, 1957
- Surface Protection and Selective Masking during Diffusion in SiliconJournal of the Electrochemical Society, 1957
- Volatile Impurities in Silicon and GermaniumJournal of Applied Physics, 1956
- Rate Limitation at the Surface for Impurity Diffusion in SemiconductorsPhysical Review B, 1956
- The growth of crystals and the equilibrium structure of their surfacesPhilosophical Transactions of the Royal Society of London. Series A, Mathematical and Physical Sciences, 1951