Negative Differential Resistance in Patterned Electroactive Self-Assembled Monolayers
- 16 August 2001
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 17 (22), 6923-6930
- https://doi.org/10.1021/la010097i
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Chemically Well-Defined Lithography Using Self-Assembled Monolayers and Scanning Tunneling Microscopy in Nonpolar Organothiol SolutionsLangmuir, 2000
- Electronic Structure of Mott Insulators Studied by Inelastic X-ray ScatteringScience, 2000
- Nanoscale Reversible Molecular Extraction from a Self-Assembled Monolayer on Gold(111) by a Scanning Tunneling MicroscopeLangmuir, 1998
- Probing Electronic Properties of Conjugated and Saturated Molecules in Self‐Assembled MonolayersAnnals of the New York Academy of Sciences, 1998
- Electrochemical and Spectroelectrochemical Study of a Bis(arylgalvinol)-Substituted Alkyl Disulfide Monolayer and Mixed Monolayers on Polycrystalline GoldLangmuir, 1998
- Scanning Probe Lithography. 4. Characterization of Scanning Tunneling Microscope-Induced Patterns in n-Alkanethiol Self-Assembled MonolayersLangmuir, 1997
- Scanning Probe Lithography. 3. Nanometer-Scale Electrochemical Patterning of Au and Organic Resists in the Absence of Intentionally Added Solvents or ElectrolytesThe Journal of Physical Chemistry, 1996
- Resonant Tunneling Bands and Electrochemical Reduction PotentialsThe Journal of Physical Chemistry, 1995
- Electrochemical Oxidation of a Galvinol-Substituted Alkanethiol MonolayerThe Journal of Organic Chemistry, 1994
- Electrochemical characteristics of a gold electrode modified with a self-assembled monolayer of ferrocenylalkanethiolsLangmuir, 1991