Plasma-assisted deposition at atmospheric pressure
- 31 March 1996
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 80 (1-2), 1-7
- https://doi.org/10.1016/0257-8972(95)02676-2
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Pulsed barrier discharges for thin film production at atmospheric pressureSurface and Coatings Technology, 1993
- Nonequilibrium volume plasma chemical processingIEEE Transactions on Plasma Science, 1991
- Chemical modification of polymers. 19. Oxidation of polyacetyleneMacromolecules, 1982