TiO2 films prepared by DC magnetron sputtering from ceramic targets
- 1 October 2002
- journal article
- Published by Elsevier BV in Vacuum
- Vol. 68 (1), 31-38
- https://doi.org/10.1016/s0042-207x(02)00279-8
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process controlThin Solid Films, 1999
- Gas-sensing applications of W–Ti–O-based nanosized thin films prepared by r.f. reactive sputteringSensors and Actuators B: Chemical, 1997
- Some properties of TiO2-layers prepared by mid-frequency and dc reactive magnetron sputteringJournal of Non-Crystalline Solids, 1997
- Chapter 1 Origins and objectivesCatalysis Today, 1994
- Electronic structure of anatase TiO2 oxideJournal of Applied Physics, 1994
- Characterization of surface film formed on titanium in electrolyte using XPSApplied Surface Science, 1992
- The Artificial Leaf, Molecular Photovoltaics Achieve Efficient Generation of Electricity from SunlightComments on Inorganic Chemistry, 1991
- High-Resolution X-Ray Photoelectron Spectroscopy as a Probe of Local Atomic Structure: Application to Amorphous Siand the Si-SiInterfacePhysical Review Letters, 1979
- Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide filmsThin Solid Films, 1979
- Thermal Expansion of Rutile and AnataseJournal of the American Ceramic Society, 1970