Characterization of reactively r.f.-sputtered tantalum oxide films
- 1 August 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 162, 325-331
- https://doi.org/10.1016/0040-6090(88)90221-0
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Effects of deposition parameters on optical loss for rf-sputtered Ta2O5 and Si3N4 waveguidesJournal of Vacuum Science and Technology, 1979