Ion implantation into insulators: charge-removal studies using ion-induced characteristic x rays
- 15 December 1972
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 21 (12), 592-595
- https://doi.org/10.1063/1.1654268
Abstract
The effectiveness of a number of charge‐removal techniques during ion implantation into insulators has been examined by monitoring the ion‐induced characteristic x‐ray emission of target atoms during protonimplantation. Successful removal of charge buildup occurs for samples which are coated with a thin conductingsurface layer and for samples which have intimate contact between the implanted region and a conducting mask and are flooded with a defocused ion beam.Keywords
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