Noninterferometric measurement of the x-ray refractive index of beryllium

Abstract

The real decrement $\delta$ of the x-ray refractive index of beryllium was measured for the $K\overline{\alpha }$ lines of Cu, Mo, and Ag to an accuracy ≲0.1% with the use of a thin-wafer monolithic Laue-Laue diffractometer of a novel design. The results are in excellent agreement with theory. A full discussion of the method is given and ways of increasing its accuracy indicated.