Synthesis, properties and performances of electrodeposited bismuth telluride films

Abstract

Bismuth telluride alloy films of uniform thickness have been successfully prepared by electrodeposition from a solution containing Bi³⁺ and HTeO₂ ⁺ ions in 1 mol dm^–3 nitric acid (pH = 0) on stainless steel. The electrodeposited films are monophasic and exhibit a polycrystalline structure (Rm). The film composition is dependent on the electrolyte composition and the current density. The electrical properties of the electrodeposited samples have been determined. The obtained films are n-type semiconductors with high carrier concentration.