Silicon Melt, Regrowth, and Amorphization Velocities During Pulsed Laser Irradiation
- 21 March 1983
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 50 (12), 896-899
- https://doi.org/10.1103/physrevlett.50.896
Abstract
Direct experimental measurements of the melt-in, resolidification, and amorphization velocities for pulsed (2.5 to 10 ns) uv and ruby-laser irradiation have been made on silicon on sapphire. An experimental value for the critical amorphization velocity in Si has been measured as 15 m/s. Epitaxial resolidification was observed from 5 to 15 m/s. Additionally, melt-in velocities in excess of 200 m/s were observed for 2.5-ns ruby irradiation.
Keywords
This publication has 7 references indexed in Scilit:
- Transitions to Defective Crystal and the Amorphous State Induced in Elemental Si by Laser QuenchingPhysical Review Letters, 1982
- Measurement of the Velocity of the Crystal-Liquid Interface in Pulsed Laser Annealing of SiPhysical Review Letters, 1982
- Macroscopic theory of pulsed-laser annealing. I. Thermal transport and meltingPhysical Review B, 1981
- A device for laser beam diffusion and homogenisationJournal of Physics E: Scientific Instruments, 1979
- Picosecond laser-induced melting and resolidification morphology on SiApplied Physics Letters, 1979
- Order-Disorder Transition in Single-Crystal Silicon Induced by Pulsed uv Laser IrradiationPhysical Review Letters, 1979
- A melting model for pulsing-laser annealing of implanted semiconductorsJournal of Applied Physics, 1979