Etch Effects from Oblique-Incidence Ion Bombardment
- 1 March 1961
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 32 (3), 369-374
- https://doi.org/10.1063/1.1736013
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- Controlled sputtering of single crystalsApplied Scientific Research, Section B, 1956
- Controlled Sputtering of Metals by Low-Energy Hg IonsPhysical Review B, 1956
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